Total internal reflection type echelle grating demultiplexer based on amorphous silicon nanowire platform

摘要：

In this paper we present measurement results of an ultracompact echelle-grating demultiplexer based on silicon-on–insulator nanowire platform, in which we introduced a total internal reflection design of the grating facets to improve the diffraction efficiency. An average increase of the diffraction efficiency with 3.7dB is observed for the 3 channels compared to a normal design.

关键词： Silicon-on-insulator Arrayed waveguide grating Etched diffraction grating Total internal reflection Diffraction efficiency

作者: Ning Zhu Jun Song Lech Wosinski Sailing He

作者单位: Joint Research Center of Photonics of the Royal Institute of Technology (Sweden)and Zhejiang Univers Centre for Optical and Electromagnetic Research,State Key Laboratory forModern Optical Instrumentati Department of Microelectronics and Applied Physics,Royal Institute ofTechnology (KTH),Electrum 229,S Centre for Optical and Electromagnetic Research,State Key Laboratory for Modern Optical Instrumentat

会议类型: 国际会议

会议名称: 2008亚太光通信会议(Asia-Pacific Optical Communications 2008)

会议地点: 杭州

会议语种:英文

在线出版日期: 2008-10-26（万方平台首次上网日期，不代表论文的发表时间）