Fabrication of a Two-Dimensional Photonic Crystals Using Reactive Ion Etching

摘要：

A triangular lattice photonic crystals with lattice constant 500nm and the diameter 300nm of air pores in the silicon-on-insulator (SOI) substrate have been designed, fabricated and realized. The processes of the fabrication of the two-dimensional photonic crystals based on SOI, including masking, electron-beam lithography, and reactive ion etching are introduced.

关键词： silicon etching photonic crystals style fabrication

作者: Jingtao Zhou Huajun Shen Huihui Zhang Xinyu Liu

作者单位: Institute of Microelectronics of Chinese Academy of Sciences Beitucheng West Road,Chaoyang District, Institute of Microelectronics of Chinese Academy of Sciences 3 Beitucheng West Road,Chaoyang Distric

会议类型: 国际会议

会议名称: The 11th IEEE International Conference on Communications Systems(第11届电子和电气工程师协会国际通信系统会议)(IEEE ICCS 2008)

会议地点: 广州

会议语种:英文

在线出版日期: 2008-11-19（万方平台首次上网日期，不代表论文的发表时间）