Numerical Simulation of Ellipsometry Measurement in Millimeter-Wave Band

摘要：

A new ellipsometry method for measuring thepermittivity and thickness of dielectric materials at millimeterwavelength is presented in this paper.The relationship betweenellipsometric parameters and dielectric material parameters isinvestigated by numerical simulation.The results show thatdifferent permittivities and different thicknesses maycorrespond to same ellipsometric parameters.However,formost dielectric films which are widely used,the permittivityand thickness can be determined uniquely.

关键词： ellipsometry millimeter wave permittivity numerical simulation

作者: Yang Xianwang Ji Minning Li Mingxiang

作者单位: School of Communication and Information Engineering,Shanghai University,Shanghai 200072,P.R.China Institute of Electronic Physics,Shanghai University,Shanghai 201800,P.R.China

会议类型: 国际会议

会议名称: 2008 China-Japan Joint Microwave Conference(2008年中日微波会议)

会议地点: 上海

会议语种:英文

页码: 723-726

在线出版日期: 2008-09-10（万方平台首次上网日期，不代表论文的发表时间）