Monolithic Silicon Micromachined Ka-band Filters

摘要：

This paper describes a novel kind of filter at Kaband on silicon substrate,which is based on the substrate integrated waveguide (SIW) design and MEMS fabrication process. Inductively coupled plasma (ICP) deep etching is used to form the square via-holes of SIW cavities.A 5-pole micromaehined filter is made from rectangular cavities integrated intoA silicon substrate and is fed by coplanar waveguide(CPW) transmission-lines through current probes.Measured results show a 0.5dB loss with a 6.5％ bandwidth atA center frequency of 30.9GHz. The final size of the filter chip is 10.0mm×2.7mm×0.4mm.This micromachined filter gives compact size and outstanding performance with relatively mature batch process.

关键词： Micromachined filters MEMS filters Substrate integrated waveguide (SIW) Inductively coupled plasma (ICP) Ka-band

作者: YU Yuanwei ZHANG Yong ZHU Jian

作者单位: Nanjing Electronic Devices Institute,Nanjing,210016,PRC National Key Lab.of Monolithic Integrated Ci Nanjing Electronic Devices Institute,Nanjing,210016,PRC

会议类型: 国际会议

会议名称: 2008 International Conference on Microwave and Millimeter Wave Technology(2008国际微波毫米波技术会议)

会议地点: 南京

会议语种:英文

页码: 1397-1400

在线出版日期: 2008-04-21（万方平台首次上网日期，不代表论文的发表时间）