The MURA Graphics problems in Large Area Photomask for concept-based Data Mining Techniques
The MURA problems will result lots of problems in photomask and TFT-LCD industries as well. In this paper, we propose a new concept for the photomask production industries, which is based on data mining techniques. Our model is suitable for every company which has the problems in MURA effects. Because our data mining techniques is a way collecting the correct information by itself, it could clean the data through their own expert. By building their own expert data warehouse, it could make our data mining techniques become a optimization mining technique, which means our model is one of the best solution to them.It could be suitable not only for every photomask company but also companies facing to the MURA problems. Our model helps them to cut down their manufacturing cost as well as promote the quality of their products.
Large Photomask MURA Data Mining
WEN-HSING KAO JASON C. HUNG VICTORIA HSU
Graduate Institute of Information Technology The Overseas Chinese Institute of Technology
国际会议
The First IEEE International Conference on Ubi-Media Coputing and Workshops(第一届泛媒体处理国际会议)
兰州
英文
2008-07-15（万方平台首次上网日期，不代表论文的发表时间）