CHEMICAL AND PHYSICAL CHARACTERISTICS OF THE SINGLE CRYSTAL SILICON SURFACE POLISHED BY THE ATMOSPHERIC PRESSURE PLASMA POLISHING (APPP) METHOD

摘要：

Atmospheric pressure plasma polishing (APPP) is a non-contacting precision machining technology.It performs the atom scale material removal by chemical reactions excited by low temperature plasma.As an important evaluation factor,the physical and chemical characteristics of the machined surface should be tested to demonstrate the machining quality.The tested surface properties offer the reference for further process optimization and facility improvement.The reduced modulus measured by commercial nanomechanical test system indicates distinct improvement of the surface mechanical properties.The further theoretical calculation on the residual stresses also testifies the elimination of the former deformation layer.The element composition on the machined surface was detected by XPS (X-ray photoelectron spectroscopy) which demonstrates the occurrence of the anticipated main reactions.And the surface topographies under AFM (atomic force microscope) and SEM (scanning electron microscopy) also indicate obvious amelioration of the surface states.

关键词： atmospheric pressure plasma physical and chemical characteristics residual stress single crystal silicon

作者: B.Wang J.F.Zhang Y.S.Wang S.Dong

作者单位: Center for Precision Engineering,Harbin Insititute ofTechnology,Harbin,Heilongjiang,150001,China Center for Precision Engineering,Harbin Insititute of Technology,Harbin,Heilongjiang,150001,China

会议类型: 国际会议

会议名称: 第二届国际非均质材料力学会议(The Second International Conference on Heterogeneous Material Mechanics)

会议地点: 安徽黄山

会议语种:英文

页码: 378-381

在线出版日期: 2008-06-03（万方平台首次上网日期，不代表论文的发表时间）