Recognizing Geometric Path from Polygon-based Integrated Circuit Layout
As the continual decrease of the feature size,The parasitic inductance and capacitance effect play important role in IC design and verification. Previous works on layout ex traction mainly concentrated on how to find out the type of devices and connections between them,few works has addressed the information of centerlines and widths of IC in-terconnects in a polygon-based VLSI layout,which are re-quired in inductance calculation and other applications. In this paper,an efficient scheme for the centerline-based path recognition from an IC mask layout is presented. Unlike the division-based methods,a tree-traverse-based approach is proposed. This new scheme can be realized as a reverse procedure of the layout generation from wire routing trees.Moreover,this scheme can handle complex all-angle wires.Experimental results show that this scheme has nearly lin-ear computational complexity yet generates precise results.
VLSI mask layout path recognition interconnect extraction
Zhaohui Yuan Shilei Sun Gaofeng Wang
School of Computer Science Institute of Microelectronics and Information Technology Wuhan university,Wuhan,430072,China
国际会议
The Fifth IEEE International Symposium on Embedded Computing(SEC 2008)(第五届IEEE国际嵌入式系统计算会议)
北京
英文
31-36
2008-10-06(万方平台首次上网日期,不代表论文的发表时间)