Fluorinated Polyimide/Epoxy Hybrid Material for Fabrication of Optical Waveguide by Single-step Photo-patterning
Introduction: Optical waveguides using fluorinated polyimide (PI), benzocyclobutene and poly(arylene ether sulfide) have been investigated to improve not only propagation losses, but also thermal stability and long-term durability. Among these polymers, Pls have been widely used in micro-and opto-electronics industries because of their thermal stability, mechanical strength, chemical resistance, and good processability. Furthermore,fluorinated and perfluorinated Pls have been widely developed as optical waveguide materials due to their low water sorption and high transparency in the visible and near-lR regions. The polymer optical waveguides have been fabricated by the conventional photo-lithographic procedures, consisting of multi-step processes of photoresist patterning, development using aqueous or organic solvents, and dry-or wet-etching. There have been demands for Single-step photo-patterning procedures for direct fabrication of channel-type waveguides without using photolithographic procedures (i.e. photo-resist patterning, developing and dry-etching). Single-step photopatterning is highly advantageous in process efficiency, manufacturing cost, and environmental friendliness.
Yuichi URANO Ningjuan CHEN Kaichiro NAKANO Katsumi MAEDA Shinji ANDO
Department of Chemistry and Materials Science,Tokyo Institute of Technology (Tokyo Tech) Ookayama 2- Nano Electronics Research Laboratories,NEC Corporation,Nakahara,Kawasaki,211-8666,JAPAN
国际会议
5th International Symposium on High-Tech Polymer Materials(HTPM-V)(第五届国际高技术高分子材料学术会议)
北京
英文
193-194
2008-10-27（万方平台首次上网日期，不代表论文的发表时间）