The Study of Pd Film Deposited on the Pure Titanium Substrate by Arc Ion Plating Technology

摘要：

Pd film was deposited on the surface of pure titanium using welding complex Pd target by arc ion plating(AIP) technology. JSM-6460 SEM, RigakuD/MAX2200X XRD and Akashi Corporation M-400-H1 micro-hardness gauge are employed to analyzed Pd film. The results indicate that Pd film shown the typical character of the arc ion plating deposition film. The film microstructure is dense, and its thickness is 1.2 ~ 2靘. The Ti4 Pd phase was formation between film and substrate because of increase deposited film temperature. The surface micro-hardness of film is about 2Gpa, the micro-hardness of between of film and substrate is 2.8Gpa owing to Ti4 Pd phase formation.

关键词： The surface of pure titanium Arc ion plating (AlP) Pd film Property

作者: Li Zhengxian Wang Shaopeng Wang Baoyun Yan Peng Xu Zhong

作者单位: Tai Yuan University of Technology,Taiyuan030024,China;Northwest Institute for Nonferrous Metal Resea Northwest Institute for Nonferrous Metal Research,Xian 710016,China Tai Yuan University of Technology,Taiyuan 030024,China

会议类型: 国际会议

会议名称: 第三届国际贵金属会议(The Third International Conference on Precious Metals)

会议地点: 西安

会议语种:英文

页码: 280-285

在线出版日期: 2008-06-01（万方平台首次上网日期，不代表论文的发表时间）