Slow highly charged ion O4+ induced electron emission from clean solid surfaces

摘要：

The total electron emission yields following the interaction of slow highly charged ions (SHCI) O4+with different material surfaces (W,Au,Si and SiO2) have been measured.It is found that the electron emission yield γ increases proportionally with the projectile velocity υ ranging from 5.36 × 105m/s to 10.7 × 105m/s.The total emission yield is dependent on the target materials,and it turns out to follow the relationship γ(Au) > γ(Si) > γ(W).The result shows that the electron emission yields are mainly determined by the electron stopping power of the target when the projectile potential energy is taken as a constant,which is in good agreement with the former studies.

关键词： Slow highly charged ion (SHCI) electron emission electron stopping power

作者: XU Zhong-Feng(徐忠锋) ZHAO Yong-Wao(赵永涛) WANG Yu-Yu(王瑜玉) ZHAO Di(赵迪) WANG Jian-Guo(王建国) LI De-Hui(李德慧) Qayyum Abdul LI Fu-Li(李福利) XIAO Guo-Qing(肖国青)

作者单位: Institute of Modern Physics,Chinese Academy of Science,Lanzhou 730000,China;Department of Applied Ph Institute of Modern Physics,Chinese Academy of Science,Lanzhou 730000,China Department of Applied Physics,Xian Jiaotong University,Xian 710049,China Physics Division,Pakistan Institute of Nuclear Science and Technology,Islamabad 44000,Pakistan

会议类型: 国际会议

会议名称: The 13th National Nuclear Physics Conference of China(第十三届全国核物理大会暨第八届会员代表大会)

会议地点: 兰州

会议语种:英文

页码: 247-250

在线出版日期: 2007-08-22（万方平台首次上网日期，不代表论文的发表时间）