Fabrication of micro carbon pillar by laser-induced chemical vapor deposition
Argon ion laser was used as the induced light source and ethane (C2H4) was selected as the precursor gas, in the variety ranges of laser power from 0.5 W to 4.5 W and the pressure of the precursor gas from 225×133.3 Pa to 680×133.3 Pa, the experiments of laser induced chemical vapor deposition were proceeded for fabrication of micro carbon pillar. In the experiments, the influences of power of laser and pressure of work gas on the diameter and length of micro carbon pillar were investigated, the variety on averaged growth rate of carbon pillar with the laser irradiation time and moving speed of focus was discussed. Based on experiment data, the micro carbon pillar with an aspect ratio of over 500 was built through the method of moving the focus.
Laser-induced chemical vapor deposition (LCVD) growing rapid diameter microcarbon
ZHOU Jian(周健) LUO Yin-she(罗迎社) LI Li-jun(李立君) ZHONG Qi-wen(钟琦文) LI Xin-hua(李新华) YIN Shui-ping(殷水平)
College of Machinery and Electrical,Centre South University of Forestry and Technology, Changsha 410 Institute of Rheological Mechanics and Material Engineering,Centre South University of Forestry and College of Machinery and Electrical, Centre South University of Forestry and Technology, Changsha 41 Department of Teaching Affair, Centre South University of Forestry and Technology, Changsha 410004,
国际会议
长沙
英文
197-201
2008-09-28（万方平台首次上网日期，不代表论文的发表时间）