Thickness and Temperature Dependence of Electrical Resistivity of n-type Bi2Te2.5Se0.5 Thermoelectric Thin Films
N-type Bi2Te2.5 Se0.5 thermoelectric thin films with thickness in the range 50-400nm have been deposited by flash evaporation method on glass substrates at 473K. The structure, composition and morphology of the deposited thin films were carried out by Xray diffraction (XRD), energy-dispersive X-ray analysis (EDXA) and field emission scanning electron microscope (FE-SEM) respectively.The thickness and temperature dependence of electrical resistivity of the thin films were studied in the temperature range 300-350K.
electrical resistivity Bi2Te2.5Se0.5 thin film flash evaporation
段兴凯 杨君友 朱文 肖承京
华中科技大学材料科学与工程学院材料成形与模具技术国家重点实验室,湖北,武汉,430074
国际会议
第二届功能原料国际研讨会(The 2rd International Symposium on Functional Materials)
杭州
英文
867-870
2007-05-16(万方平台首次上网日期,不代表论文的发表时间)