Improved electrochemical performances of oxygen plasma treated LiMn2O4 thin films
LiMn2O4 spinel thin films were deposited by radio frequency (rf) magnetron sputtering followed by annealing at 600℃ in air. The films were then post-treated with an rf driven oxygen plasma. The crystallization and surface morphology of LiMn2O4 thin films were seen to change with rf power. The treated samples were tested under harsh conditions such as deep discharge to 1.5V and cycling at elevated temperature of 60℃ to verify the electrochemical performances of LiMn2O4 cathodes. The oxygen plasma treatments improved the electrochemical properties of LiMn2O4 thin films significantly. As the cells were cycled in the range of 4.5-2.0V at 60℃, the samples treated at a proper rf power of 50W exhibited an initial capacity greater than ~400mAhg-1 with reasonable cycling stability. The results were attributed to the change of morphology and the formation of a surface layer induced by the oxygen plasma irradiation.
C C Chen K-F Chiu K M Lin H C Lin C-R Yang F M Wang
Department of Materials Science and Engineering, Feng Chia University, No 100 Wenhwa Road, Taichung, Department of Materials Science and Engineering, Feng Chia University, No 100 Wenhwa Road, Taichung, Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan 10617, R Materials Research Laboratories, Industrial Technology Research Institute, Hsinchu, Taiwan 310, Repu
国际会议
第二届功能原料国际研讨会(The 2rd International Symposium on Functional Materials)
杭州
英文
74-79
2007-05-16（万方平台首次上网日期，不代表论文的发表时间）