Orientation control and conductive property of LaNiO3 thin films deposited on Si(111) substrates
Highly (100) and (110)-oriented LaNiO3 (LNO) thin films were successfully fabricated on Si(111) substrates via metalorganic decomposition (MOD) process. The effects of different thermal treatment process and thickness on the orientation of LNO films were investigated. And the relation among the thickness, annealing temperature, (100)-orientation parameter and sheet resistivity of LaNiO3 films were also studied. The phase structure of LNO films was analyzed by X-ray diffractometer (XRD). The grain size and surface roughness was recorded by atomic force microscopy (AFM).
LaNiO3 orientation metalorganic decomposition
贾裙平 沈波 翟继卫 郝喜红
同济大学功能材料研究所,上海200092
国际会议
成都
英文
2007-11-19（万方平台首次上网日期，不代表论文的发表时间）