Nanocrystal Non-Volatile Memories: Simulation, Fabrication and Characteristics
Recently, non-volatile memory (NVM) devices utilizing discrete nanocrystals (nc) as floating gate have received considerable research interests due to their excellent memory performance and high scalability. In this paper, we will present an overview of this type of memory devices investigated in our laboratory. Key issues involving nanocrystal selection, fabrication and tunnelling barrier engineering are discussed. It is found that non-volatile memory devices utilizing nanocrystals show promising characteristics as candidates for the next generation memories, especially when metal nanocrystals and high-κ tunnelling dielectrics are adopted.
nanocrystal non-volatile memory (NVM) high-κ dielectric
Ming Liu Weihua Guan Zhigang Li Yuan Hu Shibing Long Rui Jia Qin Wang
Laboratory of Nanofabrication and Novel Device Integration,Institute of Microelectronics,Chinese Academy of Sciences
国际会议
成都
英文
2007-11-19(万方平台首次上网日期,不代表论文的发表时间)