Fabrication of single crystal nano beams with anisotropic wet etching

摘要：

Single crystal nano beams are fabricated on (111) wafers, which are isolated from the substrate electrically. Instead of anchoring to the substrate, the single crystal nano beams are fully released from the substrate and mechanically supported by the metal wires, which also serve as the electrical connections. The double clamped beams and the cantilever beams have been fabricated. Nano meter wide single crystal structures are also fabricated on (100) and (110) wafer with time controlled anisotropic etching.

关键词： nano beam Si anisotropic etching

作者: YANG Heng XU Kefeng LI Tie JIAO Jiwei LI Xinxin WANG Yuelin

作者单位: Shanghai Institute of Microsystem and Information Technology Chang Ning Road 865, 200050, Shanghai, CHINA

会议类型: 国际会议

会议名称: 第七届国际测试技术研讨会

会议地点: 北京

会议语种:英文

在线出版日期: 2007-08-05（万方平台首次上网日期，不代表论文的发表时间）