The Control System of Vacuum Coating on the Hubrid Plasma Immersion Ion Implantation & Deposition (PIII&D) Equipment and Technology

摘要：

The paper studies the control system of the thin film compound making method and device, it can fully make use of the method of magnetic control sputtering, vacuum cathodic arc ion plating, ion infusion etc. It provides plasma for the material surface of the PIII&D to change the performances of surface. It can make the structure of composition and changed surface film according to the craft. The hardness, anti-oxidize and hot stability are improved.

关键词： Magnetic Control Sputtering Vacuum coating Computer Control Real-time Monitoring Fuzzy Control

作者: YU Xinjun WANG Yanping ZANG Haihe WANG Li CHEN Xing

作者单位: College of Electrical Engineering, Henan University of Technology, Zhengzhou, 450007

会议类型: 国际会议

会议名称: 第七届国际测试技术研讨会

会议地点: 北京

会议语种:英文

在线出版日期: 2007-08-05（万方平台首次上网日期，不代表论文的发表时间）