FABRICATION OF NANOSCALE LINEWDITH STANDARDS BASED ON MULITILAYER THIN FILM DEPOSITION TECHNIQUE

摘要：

To overcome the difficulties in the fabrication of nanoscale linewidth standards with lithography, a method of fabricating nanoscale multiple linewidth standards based on multilayer thin film deposition technique is presented in this paper. This method can be implemented easily and does not require the use of complex and expensive techniques, and it has advantage of well-controlled linewidth over various millimetres (using thin film thickness control) and versatile materials selection of the grating lines. Nanoscale multiple linewidth samples with nominal linewidths of 20 nm, 25 nm, 35 nm have been fabricated with the presented method. The lines of the fabricated samples have uniform attributes and good linearity over hundreds microns.

关键词： Nanoscale linewidth standards multilayer thinfilm deposition technique linewidth uniformity line edgeroughness (LER) linewidth roughness (LWR).

作者: Fengxia Zhao Weixuan Jing Zhuangde Jiang Haoliang Duan

作者单位: State Key Laboratory for Manufacturing Systems Engineering, Xi’an, 710049, China; Institute of Preci State Key Laboratory for Manufacturing Systems Engineering, Xi’an, 710049, China; Institute of Preci State Key Laboratory for Manufacturing Systems Engineering, Xi’an, 710049, China;Institute of Precis

会议类型: 国际会议

会议名称: 2007年微纳系统集成及其商业化应用国际学术会议(2007 International Conference & Exhibition on Integration and Commercialization of Micro and Nano-Systems)

会议地点: 海南三亚

会议语种:英文

在线出版日期: 2007-01-10（万方平台首次上网日期，不代表论文的发表时间）