PZT film and Si substrate two-layer system patterning morphology by femtosecond pulsed laser
In this paper, a novel PZT film patterning method by femtosecond laser is proposed. The method is different from traditional dry-etching and wet-etching technology. Femtosecond laser microfabrication technology has several advantages such as high resolution, no mask direct-writing and seldom-heating, etc. A two-layer (PZT thin film and substrate) heating and ablating threshold model is built and the relationship of PZT/Si two-layer system micro ablation morphology depending on laser pulse energy is constructed. From the model and experiment data, we obtain the suitable energy region to pattern PZT film freely without damage Si substrate. A 3 μ m resolution of PZT pattern is achieved in our experiment. In order to verify the fabrication available of this technology, several micro functional devices are successfully patterned by optimized femtosecond pulsed laser energy and their function are detected. The results prove that the PZT patterning quality is good.
Shizhou Xiao Rui Guo Guanghua Cheng Yalei Wu Wenhao Huang Jiaru Chu
Precise Machinery and Precise Instrument Department, USTC, Hefei, 230026 State Key Laboratory of Transient Optics Technology, Xi’an Institute of Optics and Precision Mechani
国际会议
海南三亚
英文
2007-01-10（万方平台首次上网日期，不代表论文的发表时间）