Deposition of chromium aluminum nitride coatings by arc ion plating
Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target.The influence of AlN content on the phase change was studied by synthesizing Cr1.xAlxN coatings with different x values.The effects of substrate negative bias on the surface morphology,deposition rate and phase structure were investigated.As the aluminum content increases,the structure of (Cr1.xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase.The critical content of AlN solubilized in B1(NaCl) lattice is close to 0.7.With the increasing pulse negative bias,the deposition rate decreases constantly,the droplet contamination is more serious,the ion-etching effect on coating surface is more obvious,and the change of preferred orientation and the shift of XRD peak take place.
chromium aluminum nitride arc ion plating phase change pulse bias
ZHANG Shu-juan LI Ming-sheng FENG Chang-jie LIU Ting-zhi DUO Shu-wang
Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University,Nanch Department of Materials Science and Engineering,Nanchang Institute of Aeronautical Technology,Nancha
国际会议
2007年国际有色金属大会(International Conference of Nonfereous Materials 2007)(ICNFM)
长沙
英文
2007-11-28（万方平台首次上网日期，不代表论文的发表时间）