Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating

摘要：

TiO2 and N-doped TiO2 films were deposited on the glass substrates by arc ion plating method.The results show that the deposition rate does not change with the increasing deposition time.The increase of mass flow rate of N2 gives rise to the increase of deposition rate.All as-deposited TiO2 and N-doped TiO2 films are amorphous.The anatase TiO2 phase with preferred orientation (101) is acquired by post-annealing at 400 ℃ for 2 h.The incorporation of N into the TiO2 films and the heat treatment extensively shift the band edge to the visible light region.

关键词： arc ion plating photocatalytic TiO2 N-doped TiO2 absorption edge

作者: LI Ming-sheng ZHANG Shu-juan LOU Jin LIU Ting-zhi ZHOU Ze-hua YANG Gan-lan HU Chang-yuan LI Wen-kui

作者单位: Jiangxi Key Laboratory of Surface Engineering,Jiangxi Science and Technology Normal University,Nanchang 330013,China

会议类型: 国际会议

会议名称: 2007年国际有色金属大会(International Conference of Nonfereous Materials 2007)(ICNFM)

会议地点: 长沙

会议语种:英文

在线出版日期: 2007-11-28（万方平台首次上网日期，不代表论文的发表时间）