Analysis of Deep Etched Trench in Planar Optical Waveguide by FDTD Method
A finite-difference time-domain (FDTD) method is presented for simulating deep etched trench structures in planar optical waveguides. Numerical results obtained from FDTD simulations and from the Transfer Matrix Method (TMM) are compared. The effect of sidewall verticality is analyzed.
Jun Wang Mingyu Li Jian-Jun He
State Key Laboratory of Modern Optical Instrumentation, Center for Integrated Optoelectronics, Zhejiang University, Hangzhou, PR China 310027
国际会议
2007年亚洲光纤通讯与光电博览会及研讨会(Asla Optical Fiber Communication & Optoelectronic Exposition & Conference)
上海
英文
2007-10-17(万方平台首次上网日期,不代表论文的发表时间)