Fabrication and characterization of deeply-etched SiO2 waveguides

摘要：

Deeply-etched SiO2 waveguide is fabricated and characterized. The fabrication process is easier than the conventional buried SiO2 waveguide. The fabricated waveguide exhibits good performances, such as low propagation loss, broad band.

作者: Zhen Sheng Liu Yang Daoxin Dai Tingting Lang Zhechao Wang

作者单位: Centre for Optical and Electromagnetic Research, State Key Laboratory for Modern Optical Instrumentation, Zhejiang University, Hangzhou 310058, China

会议类型: 国际会议

会议名称: 2007年亚洲光纤通讯与光电博览会及研讨会(Asla Optical Fiber Communication & Optoelectronic Exposition & Conference)

会议地点: 上海

会议语种:英文

在线出版日期: 2007-10-17（万方平台首次上网日期，不代表论文的发表时间）