Deposition of ternary Cr-Al-Si Oxides and nitrides by High Ionization Pulsed Sputtering Technique (H.I.P.)
In this study the high ionization pulsing technique is used to deposit conductive Cr-Al- Si-N, and non-conductive Cr-Al-Si-O compound coatings as well as the multilayer coating (MLC) Cr-Al-Si-N/Cr-Al-Si-O-N/Cr-Al-Si-O on temperature sensitive substrates. The effects of the deposition parameters on the coating morphology and topography are studied. X-ray diffraction, scanning electron microscopy and energy dispersive x-ray analysis as well as nanoindenter, Vickers and Rockwell measurements are used to study the mechanical properties and structure of the grown coatings. Very high hardness values reaching up to 3000 HV are achieved for the MLC. The MLC also exhibits superior properties compared to the Cr-Al-Si-O and Cr-Al-Si-N coatings through combining the very good adhesion provided by the bottom nitride layer and the high hardness provided by the top non-conductive oxide layer. In order to examine the efficiency of the MLC coated tools, conventional cutting tests are performed showing enhanced performance of the MLC coated tools.
Oxide Oxynitride,High ionization pulsed sputtering
R.Cremer H-G.Fuss J.Alami
CemeCon AG Adenauerstr.20 A 4,52146 Würselen,Germnay
国际会议
西安
英文
2007-08-15（万方平台首次上网日期，不代表论文的发表时间）