Hydrodynamic Analysis of Circular Translational Polishing under Mixed Lubrication
The average Reynolds equation and average clearance equation of circular translational polishing (CTP) under the quasi-stable mixed lubrication state are set up in polar coordinates. The distributions of fluid pressure and contact pressure during polishing are numerically analyzed by solving simultaneously these equations along with the contact pressure equation. The effects of various process parameters on hydrodynamic performance of CTP are analyzed. By comparing the distributions of periodic average pressure along radial direction under fully and partially lubricated states, we conclude that carefully controlled CTP under mixed lubrication is beneficial to improving the surface quality and planarity of the wafer.
Circular translational polishing (CTP) Mixed lubrication Hydrodynamic analysis
Wenjie Zhai Changxiong Liu Peilian Feng
Harbin Institute of Technology, Harbin, China, 150001
国际会议
第14届全国磨粒技术学术会议(14th Conference of Abrasive Technology in China)
南京
英文
264-268
2007-10-26（万方平台首次上网日期，不代表论文的发表时间）