Effect of Yttrium Implantation on Microstructure and Adhesive Property of Nickel Oxide Film
Isothermal and cyclic oxidation behaviors of pure and yttrium-implanted nickel were studied at 1000℃ in the air. Scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine the micro-morphology and structure of oxide scales formed on nickel substrate. It was found that Y-implantation greatly improved the anti-oxidation ability of nickel both in isothermal and cyclic oxidizing experiments. Laser Raman Microscopy was also used to study the stress status of oxide scales formed on nickel with and without yttrium. The main reason for the improvement in anti-oxidation of nickel was that Y-implantation greatly reduced the growing speed and grain size of NiO. This fine- grained NiO oxide film might have better high temperature plasticity and could relieve parts of compressive stress by means of creeping, and maintained ridge character and relatively lower internal stress level, hence remarkably enhanced the adhesion of protective NiO oxide scale formed on nickel substrate. The actual existing form of yttrium in oxide can be Y<,2>O<,3> and NiY<,2>O<,4> spinel nanometric particles, and even be y<3+> ions segregated at NiO grain boundaries.
ion implantation laser Raman stress yttrium NiO rare earths
Jin Huiming(靳惠明) Zhou Xiaowei(周小卫) Felix Adriana
College of Mechanical Engineering, Yangzhou University, Yangzhou 225009, China College of Materials Engineering, National University of Antiuquia, Medellin 23715, Colombia
国际会议
第五届国际稀土开发与应用研讨会(The Fifth International Conference on Rare Earth Decelopment and Applicatin)
包头
英文
537-540
2007-08-07（万方平台首次上网日期，不代表论文的发表时间）