MEMs Drying using Supercritical Carbon Dioxide

摘要：

Pattern collapse (deformation or bending) of MEMs structures, a phenomenon related to the surface tension of rinse solution and a function of spacing and aspect ratio of patterns, becomes an increasingly serious problem as smaller features are desired. Excellent success using supercritical drying to prevent collapse by eliminating surface tension by means of supercritical fluid has been demonstrated on MEMs. By performing an exchange step to replace resist rinse liquid with liquid CO2, then pressurizing to supercritical and gradually reducing density until vapor is present, the rinse liquid can be ‘dried without allowing the presence of a liquid /vapor interface.

作者: Won-ho Jang Jong-sung Lim Ki-pung Yoo

作者单位: Department of Chemical and Biomolecular Engineering, Sogang University, Korea

会议类型: 国际会议

会议名称: The 5th International Conference on Separation Science and Technology(第五届国际分离科学与技术会议)

会议地点: 北京

会议语种:英文

在线出版日期: 2007-10-14（万方平台首次上网日期，不代表论文的发表时间）