The Effect of p-InGaN layer on ITO based ohmic contacts to p-GaN
By epitaxy of a thin p-InGaN layer on p-GaN surface and optimization of InGaN/GaN heterostructures annealing condition, ohmic contact to p-GaN with high transparency was obtained by using electron beam evaporated indium tin oxide film.
Yanjun Han Zhongtao Liu Yi Luo Hongxia Ma Xianpeng zhang Lai Wang
State Key Laboratory on Integrated Optoelectronics/Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing, China, 100084
国际会议
兰州·北京
英文
114-115
2007-07-29(万方平台首次上网日期,不代表论文的发表时间)