Anisotropic Wet Etching in Application of SOI-based Nano-Optoelectronic Devices

摘要：

A size reduction technology based on anisotropic wet etching is presented, which can break through the limitation of lithography resolution and find extensive application in SOI-based nano-optoelectronic devices.

作者: Fei Sun Zhiping Zhou

作者单位: Division of Optoelectronic Devices and Integration, Wuhan National Laboratory for Optoelectronics, H Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology;School

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 144-145

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）