Study on Crystal Quality of RF Magnetron Sputtered Si1-XGex Films for Thermoelectric Applications

摘要：

Improved polycrystalline characteristics have been demonstrated for Si1-xGex thin films, which are deposited on (001) n-Si substrates by optimizing RF magnetron sputtering, annealed in high temperature environment and characterized by X-ray diffraction measurements.

作者: Li-Chong Zhang Bing Xiong Yi Luo

作者单位: State Key Laboratory on Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua University, Beijing 100084 P.R.China

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 164-165

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）