Field averaging micro-lenses that synthesize highly uniform illumination in coherent EUV optical systems

摘要：

Illumination uniformity in exposure tools is critical to several aspects of the extreme ultraviolet lithography development task. Weve developed a field-averaging scanning-micro-lens system synthesizing robust, uniform illumination from non-uniform, high-coherence extreme ultraviolet sources enabling these sources to be used in applications requiring a high degree of illumination uniformity.

作者: Christopher N.Anderson Patrick P.Naulleau

作者单位: Applied Science & Technology Group, UC Berkeley Center for X-ray Optics, LBNL

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 234-235

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）