Representation and Inhibition of Abnormal Arcing in Plasma Vapor Deposition Filming

摘要：

This paper introduces representations of abnormal arcing based on equivalent impedance derived function and further proposes an inhibition design grounded on impedance change rate diagnosis in filming process of plasma vapor deposition.

作者: Linggang Kong Qingan Jiang Weizhong Zhang

作者单位: Key laboratory of Opto-Electronic Technology and Intelligent Control, Ministry of Education, Lanzhou Modem Information Technology and Education Center, Lanzhou Jiaotong University, Lanzhou 730070, Peop

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 300-301

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）