Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography

摘要：

Nano-Imprint Lithography (NIL) technology is presented to fabricate Carbon Nano-Tube (CNT) arrays for Field Emission (FE) and sensor devices by process control and optimization. Results reveal that the CNT arrays are high resolution and fidelity.

作者: Hongzhong Liu Yucheng Ding Lei Yin Bingheng Lu Duowang Fan

作者单位: State Key Laboratory for Manufacturing Systems Engineering, Xian Jiaotong University, Xian, People MOE key lab of Opto-electronic Technology and Intelligence Controll, Lanzhou Jiaotong University, La

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 312-313

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）