Fabrication of Highly ordered pore arrays by soft nanoimprint lithography

摘要：

A soft nano-imprint lithography (NIL) technology is approached to fabricate the pore arrays nanostructures.Experimental results reveal that the proposed process can fabricate highly ordered pore arrays with a low cost.

作者: Yongsheng Shi Hongzhong Liu Yucheng Ding Bingheng Lu Duowang Fan

作者单位: State Key Laboratory for Manufacturing Systems Engineering, Xian Jiaotong University, Xian, People MOE key lab of Opto-electronic Technology and Intelligence Controll, Lanzhou Jiaotong University, La

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 318-319

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）