Soft imprint lithography for pixel array manufacturing in OLED

摘要：

A soft imprint lithography(IL) process is presented to fabricate the pixel array pattern for organic lightemitting diodes. In this study, we successfully fabricate the OLED pixel array of sizes from 50μm to 5μm.

作者: Chenglong Wang Duowang Fan Hongzhong Liu

作者单位: MOE key lab of Opto-electronic Technology and Intelligence Controll, Lanzhou Jiaotong University, La State Key Laboratory for Manufacturing Systems Engineering, Xian Jiaotong University, Xian, People

会议类型: 国际会议

会议名称: 2007年纳米光电子学国际学术会议

会议地点: 兰州·北京

会议语种:英文

页码: 326-327

在线出版日期: 2007-07-29（万方平台首次上网日期，不代表论文的发表时间）