Magnetic Field Analysis of Circular Plane Magnetron Sputtering Source

摘要：

The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process. The distribution of transverse component of magnetic flux intensity on the surface of the target was calculated by means of the finite element method. Furthermore, the experiment distribution of the transverse component on the target surface was gained by practical measurement with Gauss instrument. The simulation results are consistent with the practical measurement results accurately with a good precision. These results will have important practical values in optimizing the design of magnetron sputtering target and improving the quality of thin films.

关键词： Magnetron Sputtering Finite Element Transverse Component Magnetic Flux Intensity

作者: Ma Jianping Zhang Xifeng Liu Yantao

作者单位: Department of Applied Electronics,Xian University of Technology Xian China 710048

会议类型: 国际会议

会议名称: 第八届国际电子测量与仪器学术会议(Proceedings of 2007 8th International Conference on Electronic Measurement & Instruments)

会议地点: 西安

会议语种:英文

在线出版日期: 2007-08-16（万方平台首次上网日期，不代表论文的发表时间）