FABRICATION AND CHARACTERIZATION OF TiO2 ANTIREFLECTION THIN FILM DEPOSITED ON THE SOLAR CELL
TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crystals in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the antireflection characterization of TiO2 thin film on silicon solar cell. The TiO2 thin films were prepared by DC reactive magnetron sputtering process from Ti target. The reflectivity of the films were measured by UV—3101PC, the index of refraction (n) and extinction coefficient (k) were measured by n&k Analyzer 1200,and the I-V characteristic curves of uncoated and coated solar cell were measured by I-V testing system of solar cell.
Wang Hequan Ba Dechun Shen Hui Wen Lishi
Shenyan Institute of Aeronautical Engineering,Shenyang 110034，China； Northeastern University,Shenyan Northeastern University,Shenyang 110004, China; SunYAT-SEN University,Guangzhou 510275, China; Institute of Metal Research Chinese Academy of Sciences,Shenyang 110016,China
国际会议
2007世界太阳能大会(Proceedings of ISES Solar World Congress 2007)
北京
英文
2007-09-18（万方平台首次上网日期，不代表论文的发表时间）