HOMOGENIETY OF HYDROGENATED MICROCRYSTALLINE SILICON P-LAYERS ON GLASS SUBSTRATE

摘要：

Developed large area (45×45cm) PECVD (Plasma Enhanced Chemical Vapor Deposition) method was applied to prepare p type microcrystalline silicon thin films (μc-Si:H)on borofloat glass substrates for use of silicon thin film solar cells. The resistivity, thickness and index distribution of large area μc-Si:H thin films prepared at various deposition conditions including flow ratio of source gases, pressure and temperature were measured by four-probe mapping, ellipsometry mapping and VIS-NIR spectrometer method. The homogeneity contour was illustrated to be sensitive to process parameters especially the flow ratio of source gases. This can be one of important factors to affect large area μc-Si:H thin film performance especially in production process. Pin structure on glass substrate and silicon ribbon substrate was prepared with optimized deposition conditions.

作者: Qun Ban Dietmar Borchert Martin Hanker Hui Shen

作者单位: Solarfun Power Holdings Co.666#, Linyang Road, Qidong,Jiangsu, 226200, China LSC, Fraunhofer ISE Gelsenkirchen 45884, Germany ISES, Zhongshan University C-501, Technology Institute, East Campus, Zhongshan University, Guangzhou

会议类型: 国际会议

会议名称: 2007世界太阳能大会(Proceedings of ISES Solar World Congress 2007)

会议地点: 北京

会议语种:英文

在线出版日期: 2007-09-18（万方平台首次上网日期，不代表论文的发表时间）