会议专题

THEORETICAL STUDY of nc-Si: H THIN FILM by DFT METHOD AND PHONON CONFINE MODEL

In this paper, we presented some theoretical study results about nano-crystalline silicon thin film by DFT method and phonon confine model. The nano-crystalline silicon thin films were deposited by high frequency (HF) sputtering on p-type silicon substrates at low temperature (150℃). A ℃ combination of infrared absorption, X-ray diffraction (XRD), and atomic force microscopy (AFM) measurements have been used to characterize the films. One important conclusion both from theoretical result and experimental result is that the film has a wider band-gap compared with the face- centered cubic of diamond structure of silicon film deposited by other methods.

Zhanxia Zhao Min Li Zhongquan Ma

Dept.of Physics Shanghai university Shanghai 200444, China

国际会议

2007世界太阳能大会(Proceedings of ISES Solar World Congress 2007)

北京

英文

2007-09-18(万方平台首次上网日期,不代表论文的发表时间)