The fabrication of 2-D global fiducial grid with high resolution for spatial phase locked e-beam lithography
The spatial phase locked scanning electron beam lithography systems (SPLEBL) is a new lithography technique with a pattern placement precision of about 1 nm. The SPLEBL technique can solve the major problem of poor placement accuracy existed in the conventional scanning electron beam lithography for that it uses a Fourier technique to detect the beam position in real time during exposure. The fiducial grid plays a key role in SPLEBL. The two-dimensional global fiducial grid with a grid period of 250 nm placed on top of the e-beam resist used in SPLEBL with high contrast, high brightness, long-range spatial-phase coherence, large area and a pattern placement precision of about 1 nm is fabricated using optical interference lithography in this article. The detail fabrication process is described and the SEM images of the fabricated grid are also presented in this paper. Only one evaporation step and several spin-coating steps are required in the fabrication process, so it is simple and user friendly.
lithography spatial phase fiducial grid fabrication
Jianfeng Dai Qing Wang Weixue Li Yongfu Cui Feng Zhang Henry I Smith
The department of applied physics, Lanzhou university of technology, Lanzhou, China, 730050;The stat The laboratory of nanostructure and fabrication, Massachusetts institute of technology, Cambridge, M
国际会议
郑州
英文
2007-10-23（万方平台首次上网日期，不代表论文的发表时间）