FRICTION AND WEAR PROPERTIES OF PARTIALLY POLISHED CVD DIAMOND WITH SURFACE MICROSTRUCTURE
A very low friction coefficient was achieved with partially polished diamond films. Diamond films were deposited onto TiC substrates by microwave chemical vapor deposition (MWCVD) with a gas mixture of CH4 and H2. Deposited diamond films were polished with each other up to a surface roughness Ra=0.25 μm. We propose a newly developed pin-on-disk examination to obtain a stable friction coefficient that is suitable for practical use. The pins were fabricated using four types of metal: hard die steel, D2, and stainless steels,AISI440C, AISI420 and AISI304. Friction and wear tests were carried out under ambient and nitrogen atmospheres. In the case of D2, we confiirmed a very low, stable friction coefficient μ=0.08 without any lubricants in the ambient atmosphere. Furthermore, we obtained a much lower friction coefficient in the nitrogen atmosphere. The wear volume was also extremely small in the case of the hard metals D2 and AISI440C.
CVD polycrystalline diamond partially polished diamond film friction wear pin-on-disk nitrogen atmosphere
T.Takagi H.Miki N.Yoshida T.Takeno T.Abe
Institute of Fluid Science, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577, Japan Graduate School of Engineering, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577, Japan
国际会议
南京
英文
50-56
2006-09-24（万方平台首次上网日期，不代表论文的发表时间）