Monte Carlo simulation for low-energy electron lithography

作者: ZHANG Zeng-ming XIAO Pei CHEN Tao SUN Xia DING Ze-jun

作者单位: Department of Astronomy and Applied Physics, University of Science and Technology of China, Hefei 23 Department of Physics, University of Science and Technology of China, Hefei 230026, China

会议类型: 国际会议

会议名称: Third China-Japan Joint Seminar on Atomic Level Characterization(第三届中日原子级别表征学术研讨会)

会议地点: 厦门

会议语种:英文

页码: 14-15

在线出版日期: 2006-03-06（万方平台首次上网日期，不代表论文的发表时间）