Metastable helium beam lithography by using alkanethiolates self-assembled monolayers as resists

作者: JU Xin KURAHASHI M SUZUKI T YAMAUCHI Y

作者单位: Department of Physics, Nanjing University, China;National Institute for Materials Science, Japan National Institute for Materials Science, Japan

会议类型: 国际会议

会议名称: Third China-Japan Joint Seminar on Atomic Level Characterization(第三届中日原子级别表征学术研讨会)

会议地点: 厦门

会议语种:英文

页码: 16-17

在线出版日期: 2006-03-06（万方平台首次上网日期，不代表论文的发表时间）