Dynamic Ni Gettered by PSG from S-MIC Poly-Si and Its TFTs
A dynamic PSG gettering method was proposed, in which the Ni gettered out by PSG and Ni induced a-Si to transform crystalline poly-Si are processing simultaneously. The effects of PSG gettering process on the performances of solutionbased metal induced crystallized (S-MIC) poly-Si and thin film transistors made on it were discussed. The farther-crystallization rate was much reduced by the PSG to extract the Ni as a medium source. The boundary between two neighboring domain in S-MIC poly-Si with PSG looks blurrier than that in S-MIC poly-Si without PSG. Compared to the TFTs made on S-MIC poly-Si without PSG gettering, the gate induced leakage current of TFTs made with PSG gettering were decreased and was a little improved.
Metal Induced Crystallization Polycrystalline Silicon Nickel Gettering Phosphor-Silicate Glass (PSG)
Zhiguo Meng Yang Li Chunya Wu Shuyun Zhao Wong Man Sing Kwok Hoi Shaozhen Xiong
Institute of Photo-electronics of Nankai University, The Tianjin Key Laboratory for Photo-electronic Department of electronic and computer engineering, The Hong Kong University of Science and Technolog
国际会议
上海
英文
545-550
2007-03-12(万方平台首次上网日期,不代表论文的发表时间)