Maskless Lithography and Electronic Patterning for Display Application
Kodak has been developing laser thermal maskless lithography materials and processes, potentially for display and medical (direct radiography) applications, using laser patterning and other digital patterning methods. Kodaks maskless lithographic patterning technology uses a high-power IR laser system and material and processes developed by Kodak for TFT backplane fabrication or other applications. The maskless lithographic technology is less complex without the need forshadow masks or expensive exposing systems such as a stepper or complicated process equipment. The system also is extremely useful as a rapid turnaround research tool for design optimization, process development, or product development, as well as low-cost large-scale manufacturing equipment. It is scalable and modular with a relatively small footprint. It, however, currently has some limitations, such as resolution and feature size around 4 μm, because of its pixel-based writing system. The technology further needs to be developed concurrently with material, writing equipment, and processes to meet all general requirements.
Laser Patterning Maskless Lithography TFT LCD
Seung Ho Baek Lee Tutt Michael Warner Mitchell Burberry Robert Cuffney Eran Elizur Therese Feller Elena Fedorovskaya Roger Kerr Lawrence Rowley Todd Spath
Eastman Kodak Company, Rochester, NY, U.S.A. Kodak Graphic Communications Company Canada, Vancouver, BC, CA
国际会议
上海
英文
564-568
2007-03-12（万方平台首次上网日期，不代表论文的发表时间）