Photocurable Interdielectric Materials for Application to TFT-LCD Array
New organic interdielectric materials, which have obtained by photolithographic process utilizing the negative-type photoresist formulation containing imide monomers, were characterized for good resolution, high transmittance and thermal resistance. Two novel UV monomers containing imide linkages were designed and successfully synthesized for an application to the interdielectric layer in TFT-LCD array. An aqueous alkaline developable polymer matrix was also synthesized by free radical copolymerization of benzylmethacrylate and methaciylic acid. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. Photosensitive property studies revealed good photolithographic properties with aresolution greather than 20 μm and a sensitivity of 600 mJ/cm2.
Photoresists Ultraviolet (UV) Exposure Imide
Lee Soon Park Soon Hak Kim Youngjune Hur Bong Seok Moon Younghwan Kwon Hyo Jung Lee
Department of Polymer Science;Advanced Display Manufacturing Research Center;Mo bile Display Researc Advanced Display Manufacturing Research Center;Mo bile Display Research Center, Kyungpook National U Samyang EMS Co., Chungnam, Korea Advanced Display Manufacturing Research Center;Mo bile Display Research Center, Kyungpook National U Department of Polymer Science
国际会议
上海
英文
570-573
2007-03-12（万方平台首次上网日期，不代表论文的发表时间）