Fabrication of Nanocrystalline Diamond Film for Cold Cathode in Plasma Display Panels
This paper discusses the fabrication of nano-crystalline diamond films of large area up to 4 × 4 cm2. Using electron assisted-hot filament chemical vapor deposition (EA-HFCVD) method, diamond films were synthesized with a bias current of 6 A applied for 1 h, followed with no bias current for 3 h at 0. 8 kPa gas pressure. Atomic force microscopy (AFM) study revealed the diamond grain size of 30 nm. Three points randomly selected on the sample were characterized by AFM. Good continuity of diamond film was proven. Applying ellipsometer and spectrometer, we measured the refractive index and transmittance of prepared diamond film. Good quality was proven with a transmittance above 50％ in the infrared range. Defined H- and O- surface termination of diamond films were achieved respectively. Using certain methodology, we found out the H-tenninated diamond films outperformed O-terminated diamond films with γ around 0.45.
Nano-crystalline Diamond Film High γ Transmittance EA-HFCVD
Xuefeng Zhu Linjun Wang Guang Hu Juanmin Liu Jian Huang Jinyong Xu Yiben Xia
School of Materials Science and Engineering,Shanghai University, Shanghai 200072, China
国际会议
上海
英文
1260-1264
2007-03-12（万方平台首次上网日期，不代表论文的发表时间）