Study on Silicon Microchannel Plate Image Intensifier
MicroChannel plate (MCP) is an image intensifier widely used for detecting and imaging of die electrons, ions, UV radiation, and soft X-ray fluxes. The traditional preparation of MCP is a process of glass fiber drawing and hydrogen reduction. In this paper, a new method for fabricating MCP was proposed and studied. A silicon MCP was prepared based on bulk-micromachining technology, dry etching technology and electrochemical process respectively. In dry etching, a SiMCP with 15 -30 aspect ratio of the microchannel, 6-20 μm dimension of pore, 6 -8 μm space were prepared by Inductively Coupled Plasma (ICP). The electron gain for the sample of aspect ratio of 16 was about 110. In wet process, both p-type and n-type silicon was selected as the substrate for MCP. The electrochemical mechanism of silicon anisotropy etching were investigated and discussed. The results shows that the high aspect ratio of silicon microchannel arrays can be made by both dry and wet etching processes. The electrochemical process for silicon microchannel arrays has lower cost than ICP process.
Microchannel Plate Micromachining Silicon Image Intensifier
Guozheng Wang Ye Li Yanjun Gao Delong Jiang Shencheng Fu Kui Wu Qingduo Duanmu
School of Science, Changchun University of Science and Technology,Changchun 130022, China
国际会议
上海
英文
1337-1341
2007-03-12（万方平台首次上网日期，不代表论文的发表时间）