Photolithography Techniques for Patterning Upper Electrodes in Inorganic Electroluminescent Displays
(0) Photolithography techniques for patterning upper electrodes for inorganic electroluminescent (EL) displays have been developed and their impact on the performance of the patterned EL display panels has been analyzed. Inorganic EL display is an emissive type of display technology which is all solid state, enabling inherently superior qualities such as wide viewing angle, wide temperature range, and high resistance to shock and vibration. Because of these unique attributes, thin film electroluminescent (TFEL) displays are expected to continue to retain a niche market despite of their lack of full-color capabilities and the stiff competition by other flat panel display technologies such as LCD. The patterning methods for upper electrodes of inorganic EL display commonly include shadow mask approach, conventional photolithography with wet or dry etching or lift-off as well as laser patterning techniques. The lack of precision in the shadow mask approach limits its application to lower resolution display applications , whereas laser patterning techniques are time consuming and require expensive equipments. Conventional photolithography techniques with or without lift-off process to pattern upper electrodes in EL displays have been developed and will be reported in this paper. Organic solvents without water have been used throughout the photolithography process in order to avoid any damage to the phosphor and dielectric layers underneath the upper electrodes. The EL display panels patterned by the new techniques are comparable in electro-optical performance to those with the upper electrodes evaporated directly through a shadow mask, as demonstrated by the slope of the L-V curve and the threshold voltage etc. A patterning precision of 10 μm is easily achievable, which is limited only by the current exposure system being used. Therefore high-resolution EL display patterning has been made possible by utilizing the techniques developed in this work.
Photolithography Inorganic Electroluminescent Display Thin Firm Electroluminescent Display (TFEL) Upper Electrodes Patterning Lift-off Electro-optical Performance
Hongjun Liu Tao Chen Zhan Shi Yi Zhang Gang Zhou Tian Xiao
Flat Panel Display Technology R&D Center,SVA Electron Co., Ltd., 196 Ouyang Rd., Shanghai 200081, China
国际会议
上海
英文
1563-1565
2007-03-12（万方平台首次上网日期，不代表论文的发表时间）