UV-vis Spectroscopy Study of the Resist Film Thickness

摘要：

We proposed a new method to measure the resist film thickness, which is, to use the Beer-Lamberts Law to determine the film thickness, using the UV-visible spectroscopy. The negative photoresist in our study uses the acrylic as the resin, which has the film thickness of 50 μm and 100 μm, respectively. We observed that the absorbance maximum at 350 nm for 50 μm thick dry resist film is 0.728 0 while the absorbance maximum at the same wavelength for 100 μm thick resist is 1.468 5. Here the positive photoresist uses the novolac as the resin while the film thickness in our study is typically between 1-5 μm. In this particular experiment, the absorbance is 1.757 4 at 403.8 nm while the film thickness is measured to be 2. 06 μm through the scanning electron microscopy. Another resist film has the absorbance of 0. 982 3 at 403.8 nm and the film thickness is 1.15 μm.

关键词： UV-vis Spectroscopy Beer-Lamberts Law Resist Film Thickness Absorbance

作者: Le Wang Ping Linda Zhang Liyu Liu Haokang Zhang Lujia Fan Luchuan Zhang Yong Yang Ruikun Huang Xinjie Zhou Dongliang Li

作者单位: College of Integrated Circuits, Southeast University,Nanjing 210096, China Department of Electronic Engineering, Southeast University,Nanjing 210096, China Nanjing Electronics Device Institute, Nanjing, Jiangsu, 210016, China Department of Chemical Engineering, Southeast University,Nanjing 211189, China

会议类型: 国际会议

会议名称: 2007亚洲显示国际会议（AD07）

会议地点: 上海

会议语种:英文

页码: 1904-1907

在线出版日期: 2007-03-12（万方平台首次上网日期，不代表论文的发表时间）